Amy E Wendt

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Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures

John B Boffard,Chun C Lin,Shicong Wang,A E Wendt, Cody Culver,Svetlana B Radovanov,Harold Persing

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, no. 2 (2015)

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Comparison of surface vacuum ultraviolet emissions with resonance level number densities. I. Argon plasmas

John B Boffard,C C Lin, Cody Culver,Shicong Wang,A E Wendt,Svetlana B Radovanov,Harold Persing

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, no. 2 (2014)

Cited by2Bibtex

Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy

Shicong Wang,A E Wendt,John B Boffard,Chun C Lin,Svetlana B Radovanov,Harold Persing

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, no. 2 (2013)

Cited by9Bibtex

Evidence of weak plasma series resonance heating in the H-mode of neon and neon/argon inductively coupled plasmas

John B Boffard,R O Jung,Chun C Lin, L E Aneskavich,A E Wendt

JOURNAL OF PHYSICS D-APPLIED PHYSICS, no. 38 (2012)

Cited by2Bibtex

Argon 420.1–419.8 nm emission line ratio for measuring plasma effective electron temperatures

John B Boffard,R O Jung,Chun C Lin, L E Aneskavich,A E Wendt

JOURNAL OF PHYSICS D-APPLIED PHYSICS, no. 4 (2012)

Cited by11Bibtex

Optical diagnostics for characterization of electron energy distributions: argon inductively coupled plasmas

John B Boffard,R O Jung,Chun C Lin, L E Aneskavich,A E Wendt

PLASMA SOURCES SCIENCE & TECHNOLOGY, no. 5 (2011)

Cited by13Bibtex

Optical emission measurements of electron energy distributions in low-pressure argon inductively coupled plasmas

John B Boffard,R O Jung,Chun C Lin,A E Wendt

PLASMA SOURCES SCIENCE & TECHNOLOGY, no. 6 (2010)

Cited by26Bibtex

Sidewall damage in plasma etching of Si/SiGe heterostructures

R. Ding,L. J. Klein,Mark G. Friesen,M. A. Eriksson,A. E. Wendt

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, no. 4 (2009): 836-843

Cited by8Bibtex

Measurement of metastable and resonance level densities in rare-gas plasmas by optical emission spectroscopy

John B Boffard,R O Jung,Chun C Lin,A E Wendt

PLASMA SOURCES SCIENCE & TECHNOLOGY, no. 3 (2009)

Cited by40Bibtex

Energy distribution of bombarding ions in plasma etching of dielectrics

F L Buzzi,Y-H Ting,A E Wendt

PLASMA SOURCES SCIENCE & TECHNOLOGY, no. 2 (2009)

Cited by41Bibtex

Ion energy control at substrates during plasma etching of patterned structures

R. Silapunt,A. E. Wendt,K. H. R. Kirmse

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, no. 6 (2007): 1882-1887

Cited by10Bibtex

Arbitrary substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing

M M Patterson,H-Y Chu,A E Wendt

PLASMA SOURCES SCIENCE & TECHNOLOGY, no. 2 (2007): 257-264

Cited by25Bibtex

Anisotropic fluorocarbon plasma etching of Si∕SiGe heterostructures

R. Ding,L. J. Klein,M. A. Eriksson,A. E. Wendt

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, no. 2 (2007): 404-409

Cited by3Bibtex

Ion bombardment energy control for selective fluorocarbon plasma etching of organosilicate glass

R. Silapunt,A. E. Wendt,K. Kirmse,L. P. Losey

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, no. 2 (2004): 826-831

Cited by15Bibtex

High-voltage constraints for vacuum packaged microstructures

Wilson, C.G.,Gianchandani, Y.B.,Wendt, Amy E.

Microelectromechanical Systems, Journal of , no. 6 (2003): 835-839

Cited by7EIWOSBibtex

Fabrication of Polymeric Substrates with Well-Defined Nanometer-Scale Topography and Tailored Surface Chemistry

S.-R. Kim,A. I. Teixeira,P. F. Nealey,A. E. Wendt,N. L. Abbott

ADVANCED MATERIALS, no. 20 (2002): 1468-+

Cited by4Bibtex

Method and apparatus for plasma processing with control of ion energy distribution at the substrates

A E Wendt, Shiangbau Wang

(2001)

Cited by23Bibtex

Ion bombardment energy and SiO 2 /Si fluorocarbon plasma etch selectivity

S.-B. Wang,A. E. Wendt

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, no. 5 (2001): 2425-2432

Cited by10Bibtex

Interactions between plasmas in ionized physical vapor deposition discharges

Y. Andrew,Z. Lu,T. Snodgrass,G. Teitzel,A. E. Wendt

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, no. 5 (2000): 2137-2142

Cited by3Bibtex

Erratum: “Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition” [J. Vac. Sci. Technol. A 16, 2198 (1998)]

J. E. Foster,A. E. Wendt,W. W. Wang,J. H. Booske

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, no. 1 (1999): 322-322

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Amy E WendtBinding

Papers25 papers

Amy E Wendt