Chang Moon Lim

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PHOTOMASK AND METHOD FOR FORMING PATTERN OF SEMICONDUCTOR DEVICE USING THE SAME

Byoung Hoon Lee,Chang Moon Lim,Myoung Soo Kim, Jeong Su Park,In Hwan Lee

(2014)

Bibtex

LITHOGRAPHY PROCESSES UTILIZING EXTREME ULTRAVIOLET RAYS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME

Jun Taek Park,Chang Moon Lim,Seok Kyun Kim

(2013)

Bibtex

A scatterometry-based CD uniformity control solution for Spacer Patterning Technology

Jongsu Lee,Chang Moon Lim, Chanho Ryu, Myoungsoo Kim,Hyosang Kang, Hugo Cramer, Noelle Wright,Birgitt Hepp, Liesbeth Reijnen, Hans Van Der Laan, Maryana Escalante Marun,Peter Ten Berge

(2012)

Cited by2Bibtex

Diffused aerial image model semiconductor device fabrication

Chang Moon Lim, Jun Taek Park

(2009)

Cited by1Bibtex

Method of forming pattern of semiconductor device

Seo Min Kim,Chang Moon Lim

(2009)

Bibtex

Method for Manufacturing a Semiconductor Device

Jae Chang Jung,Cheol Kyu Bok,Chang Moon Lim,Seung Chan Moon

(2009)

Cited by441Bibtex

Polymer for immersion lithography and photoresist composition

Jae Chang Jung,Cheol Kyu Bok,Chang Moon Lim,Seung Chan Moon

(2009)

Cited by1Bibtex

Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same

Jae Chang Jung,Cheol Kyu Bok,Chang Moon Lim,Seung Chan Moon

(2008)

Cited by7Bibtex

Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device

Jae Chang Jung,Cheol Kyu Bok,Chang Moon Lim,Seung Chan Moon

(2007)

Cited by3Bibtex

Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same

Jae Chang Jung,Cheol Kyu Bok,Sam Young Kim,Chang Moon Lim,Seung Chan Moon

(2007)

Cited by1Bibtex

New high antireflection-coating polymers useful for forming samples for semiconductor devices and in immersion lithography

Jae Chang Jung,Cheol Kyu Bok,Chang Moon Lim,Seung Chan Moon

(2006)

Bibtex

Oberste Antireflektionsbeschichtungszusammensetzung und Verfahren zur Musterausbildung für eine Halbleitervorrichtung unter Verwendung derselbigen

Jae Chang Jung,Cheol Kyu Bok,Sam Young Kim,Chang Moon Lim,Seung Chan Moon

(2006)

Bibtex

Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same

Jae Chang Jung,Cheol Kyu Bok,Chang Moon Lim,Seung Chan Moon

(2006)

Cited by6Bibtex

Heterogeneous diffusion model for simulation of resist process

Chang Moon Lim, Jun Taek Park, Seo Min Kim,Hyeong Soo Kim,Seung Chan Moon

(2006)

Bibtex

Top antireflective coating process for immersion lithography

Jae Chang Jung,Sung Koo Lee,Keun Do Ban, Seo Min Kim,Cheolkyu Bok,Chang Moon Lim,Seung Chan Moon

Advances in Resist Technology and Processing XXII, Pt 1 and 2, (2005): 519-526

Cited by6Bibtex

Phase shift mask

Chang Moon Lim, Seo Min Kim

(2004)

Bibtex

Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

Taeseung Eom,Chang Moon Lim, Seomin Kim, Heebom Kim, Seyoung Oh, Wonkwang Ma, Seungchan Moon, Ki Soo Shin

(2003)

Cited by3Bibtex

Analysis of nonlinear overlay errors by aperture mixing related with pattern asymmetry

Chang Moon Lim,Ki Sung Kwon, Dong Gyu Kim, Dong Hwan Son,Hyeong Soo Kim, Kiho Baik

(1997)

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Chang Moon LimBinding

Papers19 papers

Chang Moon Lim