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Brenner’s interests include atomistic simulations of the structure, growth and properties of thin films; simulated engineering of nanometer-scale structures and devices; solid-state chemical dynamics.
Dr. Brenner’s group’s research uses atomic-scale computer simulations to develop a fundamental understanding of many-body chemical dynamics in condensed phases, with an emphasis on technologically-important materials and processes. Specific areas of interest currently include molecule-surface collisions and thin film vapor deposition; energy transfer, friction, tribochemistry and their influence on the wear of sliding solid interfaces; shock-induced chemistry in solids; nanometer-scale structure and mechanical properties of grain boundaries in covalent materials; mechanisms of cross-linking and hardening of polymers via ion bombardment; and the development of new strategies for engineering nanometer-scale structures and devices. Much of the engineering of advanced materials and electronic devices in the next century will likely require building structures on a microscopic if not an atom-by-atom level. By exploring this realm, their simulations are helping to lay the foundation for the next generation of materials engineering.
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Simon Divilov,Hagen Eckert,David Hicks,Corey Oses,Cormac Toher,Rico Friedrich,Marco Esters,Michael J. Mehl, Adam C. Zettel, Yoav Lederer,Eva Zurek,Jon-Paul Maria,
Natureno. 7993 (2024): 66-73
arXiv (Cornell University) (2023)
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Metalsno. 12 (2022)
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