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Fre´de´ric Pommereau received the Doctorate degree from the Universite´ de Paris XI, Orsay, France, in 1989. His Ph.D. dissertation is on the modeling of contact lithography for the fabrication of GaAs ICs.
From 1989 to 1991, he was engaged in the fabrication of integrated circuits on silicon with MATRA MHS. He joined Alcatel Alsthom Research Marcoussis, France, in 1991, and has been involved in research activities on semiconductor optical amplifiers (SOA), arrayed waveguides and SOAs, high-speed photodiodes, and more recently, photonic crystals. He is now responsible within Alcatel Thales III–V Laboratoire for technology implementation including lithography and etching on III–V semiconductors, and is involved in several European projects and French national RNRT projects.
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IEEE Photonics Technology Lettersno. 23 (2009): 1746-1748
Bell Labs Technical Journal - Enabling Science and Technologyno. 3 (2009): 63-84
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE) (2008)
international semiconductor laser conferencepp.137-138, (2006)
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