Harold M. Persing

U.S. Geological Survey, 345 Middlefield Road, Menlo Park, CA 94205-3591, USA

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Papers36 papers

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Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures

John B Boffard,Chun C Lin,Shicong Wang,A E Wendt, Cody Culver,Svetlana B Radovanov,Harold Persing

Journal of Vacuum Science and Technology, (2015)

Bibtex

Comparison of surface vacuum ultraviolet emissions with resonance level number densities. I. Argon plasmas

John B Boffard,C C Lin, Cody Culver,Shicong Wang,A E Wendt,Svetlana B Radovanov,Harold Persing

Journal of Vacuum Science and Technology, (2014)

Cited by2Bibtex

Pulsed plasma to affect conformal processing

Helen Maynard, Vikram Singh, Svetlana B Radovanov,Harold M Persing

(2014)

Cited by1Bibtex

Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy

Shicong Wang,A E Wendt,John B Boffard,Chun C Lin,Svetlana B Radovanov,Harold Persing

Journal of Vacuum Science and Technology, (2013)

Cited by9Bibtex

Plasma process optimization for N-type doping applications

Deven Raj,Harold M Persing, S Salimian, Kerry Lacey, Shu Qin, Jeff Y Hu, Allen Mcteer

AIP Conference Proceedings, (2012): 67-70

Cited by3Bibtex

Process characterization of a novel conformal FinFET doping

K Han, S Tang, T Rockwell, Ludovic Godet,Harold M Persing, Daniel Distaso, C Campbell, S Salimian

AIP Conference Proceedings, (2012): 197-200

Cited by2Bibtex

CLOSED LOOP PROCESS CONTROL OF PLASMA PROCESSED MATERIALS

George D Papasouliotis, Deven M Raj,Harold M Persing

(2012)

Cited by1Bibtex

A novel plasma-based technique for conformal 3D FINFET doping

K Han,S Tang, T Rockwell,Ludovic Godet,Harold M Persing, Clinton Campbell, S Salimian

(2012)

Cited by5Bibtex

OUTGASSING RATE DETECTION

S R Walther,Harold M Persing

(2009)

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LOCAL PRESSURE SENSING IN A PLASMA PROCESSING SYSTEM

S R Walther,Harold M Persing

(2009)

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Plasma Doping System with In-Situ Chamber Condition Monitoring

Atul Gupta, Timothy Miller,Harold M Persing, Daniel Distaso, Vikram Singh

(2009)

Cited by4Bibtex

PROFILE ADJUSTMENT IN PLASMA ION IMPLANTER

Ludovic Godet,George D Papasouliotis, Ziwei Fang, Richard Appel, Vincent Deno, Vikram Singh,Harold M Persing

(2009)

Cited by6Bibtex

PLASMA ION IMPLANTATION PROCESS CONTROL USING REFLECTOMETRY

Harold M Persing, Vikram Singh, E Arevalo

(2008)

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Plasma Source with Liner for Reducing Metal Contamination

Richard J Hertel, You Chia Li, Philip J Mcgrail, Timothy J Miller,Harold M Persing, Vikram Singh

(2008)

Cited by5Bibtex

TECHNIQUE FOR USING AN IMPROVED SHIELD RING IN PLASMA-BASED ION IMPLANTATION

Timothy Miller,Edmund J Winder, Richard J Hetel,Harold M Persing, Vikram Singh

(2008)

Bibtex

Technique pour un dépôt de couche atomique

Vikram Singh,Harold M Persing,Edmund J Winder, Jeffrey Hopwood, Anthony Renau

(2007)

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Plasma Immersion Ion Source With Low Effective Antenna Voltage

Harold M Persing, Vikram Singh,Edmund J Winder

(2007)

Cited by10Bibtex

Faraday dose and uniformity monitor for plasma based ion implantation

S R Walther, Rajesh Dorai,Harold M Persing, J T Scheuer,Bonwoong Koo,Bjorn O Pedersen, Christopher J Leavitt, Timothy J Miller

(2006)

Bibtex

B2H6 PLAD Doped PMOS Device Performance

Zheng Ping Fang, Teresa G Miller,Edmund J Winder,Harold M Persing, E Arevalo,Anuj Kumar Gupta, Thomas Parrill,Virendra Singh, Shu Kai Qin, Allen Mcteer

(2006)

Cited by2Bibtex

Technique for boron implantation

Vikram Singh,Edmund J Winder,Harold M Persing, Timothy J Miller, Ziwei Fang, Atul Gupta

(2006)

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Harold M. PersingBinding

Papers36 papers

Harold M. Persing