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论文共 80 篇作者统计合作学者相似作者

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Patterning optimization for single mask bit-line-periphery and storage-node-landing-pad DRAM layers using 0.33NA EUV lithography at the resolution limit
Van Tuong Pham, Jeonghoon Lee,Kaushik Sah, Ying-Lin Chen, Seonggil Heo, Soobin Hwang,Kenichi Miyaguchi,bappaditya Dey, Maria V. Chistiakova,Peter De Schepper,Philippe Bezard,Sara Paolillo,
Advances in Patterning Materials and Processes XLI (2024)
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Single mask solution to pattern DRAM LILP layer at 42nm pitch using EUV car photoresist
Arijit Das, Kiho Yang, Toto Chen, Pierce Chang, Sheng-Tse Chen, Shu-De Gong,Hyo Seon Suh, Jeonghoon Lee, Jan-Frederik Finoulst, Chris Wilson,Paulina A. Rincon-Delgadillo,Murat Pak
Optical and EUV Nanolithography XXXVII (2024)
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Machine, process, and material efforts towards sustainable lithography
Andreia Santos, Wesley Zanders, Elke Caron, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken,Hyo Seon Suh,Douglas J. Guerrero,Masahiko Harumoto, Tsuyoshi Mitsuashi
Advances in Patterning Materials and Processes XLI (2024)
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Material and process optimization for EUV pattern rectification by DSA
Lander Verstraete,Hyo Seon Suh, Julie Van Bel, Byeong-U Bak, Seong Eun Kim,Remi Vallat,Philippe Bezard, Matteo Beggiato, Christophe Beral
Novel Patterning Technologies 2024 (2024)
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Organic dry development rinse (O-DDR) process for spin-on MOR to prevent pattern collapse
Seonggil Heo, Seungjoo Baek,Mihir Gupta,Hyo Seon Suh, Kodai Kato,Satoshi Takeda,Wataru Shibayama, Rikimaru Sakamoto
Advances in Patterning Materials and Processes XLI (2024)
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Main chain scission resists towards high-NA EUV lithography
Akihide Shirotori, Yuji Oda, Rui Zhang, Kazunori Taguchi, Nobuhiro Sato, SinFu Yeh,Hyo Seon Suh,Danilo De Simone,Geert Vandenberghe, Hideaki Sanuki
Advances in Patterning Materials and Processes XLI (2024)
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Update on main chain scission resists in Zeon for high-NA EUV lithography
Akihide Shirotori, Yuji Oda, Kazunori Taguchi, Sin Fu Yeh,Hyo Seon Suh,Danilo. De Simone,Geert Vandenberghe, Hideaki Sanuki
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
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Scaled-down deposited underlayers for EUV lithography
Mihir Gupta, Joao Antunes Afonso,Philippe Bezard,Remi Vallat,Roberto Fallica,Hyo Seon Suh,Sandip Halder,Danilo De Simone, Zecheng Liu, Fanyong Ran, Hideaki Fukuda, Yiting Sun,
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XL (2023)
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EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity study
Julie Van Bel, Lander Verstraete,Hyo Seon Suh, Stefan De Gendt,Philippe Bezard, Jelle Vandereyken, Waikin Li, Matteo Beggiato,Amir-Hossein Tamaddon, Christophe Beral, Andreia Santos, Boaz Alperson,
Novel Patterning Technologies 2023 (2023)
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Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis
Roberto Fallica, Weizhong Huang,Hyo Seon Suh,Danilo De Simone,Douglas J. Guerrero, Kodai Kato
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
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