Hyuk-Joo Kwon

Taejon National University of Technology Division of Advanced Materials Science and Engineering San 16-1 Deokmyung-dong, Yusong-ku 305-719 Taejon Korea

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Papers28 papers

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Implementation of pressure monitoring system(PMS) for ship's engine performance analysis(SEPA) based on the web

Sunggeun Lee,Hyukjoo Kwon, Hyunsuk Yang

(2014)

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LUMINESCENT COMPOUNDS AND ELECTROLUMINESCENT DEVICE USING THE SAME

Ilwon Choi, Chisik Kim,Hyukjoo Kwon, Youngjun Kwon, Bongok Kim, Sungmin Kim,Seung Soo Yoon

(2011)

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Requirements of nano-machining repair system for 45-nm node

Hwasung Kim, Hongseok Shim, Suyoung Lee, Geunbae Kim,Hyukjoo Kwon, Sanggyun Woo, Hanku Cho

(2007)

Cited by1Bibtex

Photomask dry-etching techniques for hard mask

Sungwon Kwon, Youngju Park, Sungyoon Kim, Hanshin Lee,Hyukjoo Kwon, Seungwoon Choi, Woosung Han

(2006)

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The study of optical performance for quartz dry etching quality in ArF lithography

Wonsuk Ahn, Hyekyung Lee, Youngju Park,Hyukjoo Kwon, Seongwoon Choi, Woosung Han

Proceedings of SPIE, (2006)

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Evaluations of optical performance for micro-trench on quartz etch in ArF lithography

Wonsuk Ahn,Hyukjoo Kwon, Seongyong Moon, Seongwoon Choi, Woosung Han

(2005)

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A study of Cr to Mosi in-situ dry etching process to reduce plasma induced defect

Ilyong Jang, Youngju Park,Hyukjoo Kwon, Seongyong Moon, Seongwoon Choi, Woosung Han

(2005)

Cited by1Bibtex

Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing

Yongdae Kim, Daewoo Kim, Dongseuk Lee, Piljin Jang,Hyukjoo Kwon, Hyunjun Cho, Jinmin Kim, Sangsoo Choi

(2004)

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Dehydration bake effects with UV/O3 treatment for 130-nm node PSM processing

Yongdae Kim, Dongseuk Lee, Dongil Park,Hyukjoo Kwon, Jinmin Kim, Sungmo Jung, Sangsoo Choi

(2003)

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A study of post-exposure baking effect for CAR process in photomask fabrication

Dongil Park, Sunkyu Seo, Woogun Jeong, Euisang Park, Jonghwa Lee,Hyukjoo Kwon, Jinmin Kim, Sungmo Jung, Sangsoo Choi

(2003)

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Comparative evaluation of mask cleaning performance

Woogun Jeong, Dongil Park, Euisang Park, Youngwoong Cho, Sejong Choi,Hyukjoo Kwon, Jinmin Kim

(2003)

Cited by14Bibtex

Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process

Dongil Park, Euisang Park, Jonghwa Lee, Woogun Jeong, Sunkyu Seo,Hyukjoo Kwon, Jinmin Kim, Sungmo Jung, Sangsoo Choi

(2003)

Cited by12Bibtex

Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production

Woogun Jeong, Dongil Park, Euisang Park, Sunkyu Seo,Hyukjoo Kwon, Jinmin Kim, Sungmo Jung, Sangsoo Choi

Proceedings of SPIE, (2003)

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Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Sejong Choi, Hansun Cha,Siyeul Yoon,Yongdae Kim, Donghyuk Lee, Jinsu Kim, Dongsoo Min, Piljin Jang, Byungsoo Chang,Hyukjoo Kwon, Booyeon Choi,Soo Hong Jeong

Proceedings of SPIE, (2002)

Cited by2Bibtex

Application of multiple-wavelength absorption endpoint system in photomask dry etcher