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个人简介
Joel K.W. Yang is an Associate Professor at the Singapore University of Technology and Design. He received his SM (2005) and PhD (2009) degrees from the Massachusetts Institute of Technology, in Electrical Engineering and Computer Science. His research interests are in nanoplasmonics, plasmonic color printing, field-enhancement in ultra-small gaps, and nanofabrication with sub-10-nm resolutions. He holds a joint appointment at the Institute of Materials Research and Engineering (IMRE) of A*STAR where he is co-head of the Plasmonic and Semiconductor Nanostructures Lab. He is recognized for his pioneering work in color printing at the ultimate resolution limit (100,000 dpi) using plasmonic nanostructures, and for the widely-used “salty-developer” to improve the resolution of electron beam lithography. He has published high-impact papers in Science, Nature Nanotechnology, Nano Letters, ACS Nano, and Nature Communications. He was the recipient of the MIT Technology Review TR35@Singapore award, and the Singapore Young Scientist Award.
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论文共 247 篇作者统计合作学者相似作者
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Hao Wang,Cheng-Feng Pan,Chi Li, Kishan S. Menghrajani,Markus A. Schmidt,Aoling Li, Fu Fan, Yu Zhou,Wang Zhang,Hongtao Wang,Parvathi Nair Suseela Nair,John You En Chan,
INTERNATIONAL JOURNAL OF EXTREME MANUFACTURINGno. 4 (2024): 042002
Nature communicationsno. 1 (2024): 3719-3719
Jiahui Xu,Hailong Liu,Hongtao Wang, Yiming Wu, Hao Wang, Benjamin Yue Hao Tan,Joel K. W. Yang,Renaud A. L. Vallee,Xiaogang Liu
CHEMno. 2 (2024)
ACS photonicsno. 3 (2024): 816-865
ADVANCED OPTICAL MATERIALSno. 5 (2024)
Next Nanotechnology (2024): 100062
Yuanda Liu, Yaze Wu,Ruihuan Duan, Jichao Fu, Martin Ovesen, Samuel Chang En Lai, Think-E Yeo,Jing Yee Chee, Yunjie Chen,Siew Lang Teo,Hui Ru Tan,Wang Zhang,
Advanced materials (Deerfield Beach, Fla.)pp.e2401838-e2401838, (2024)
NANOPHOTONICSno. 8 (2023): 1359-1361
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Light: Advanced Manufacturingno. 3 (2023): 243-250
Journal of the Royal Society, Interfaceno. 202 (2023): 20230135
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