Bounouar, Julien

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Contamination Control for Wafer Container Used within 300 mm Manufacturing for Power Microelectronics

Germar Schneider, Thi Quynh Nguyen, Matthias Taubert,Julien Bounouar, Catherine Le-Guet,Andreas Leibold, Helene Richter,Markus Pfeffer

Solid State Phenomena, (2016): 381-386

Bibtex

STATION AND METHOD FOR MEASURING PARTICLE CONTAMINATION OF A TRANSPORT CARRIER FOR CONVEYING AND STORING SEMICONDUCTOR SUBSTRATES AT ATMOSPHERIC PRESSURE

Cindy Thovex,Julien Bounouar, Arnaud Favre

(2015)

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FOUP Material Influence on HF Contamination during Queue-Time

Julien Bounouar,Thi Quynh Nguyen, Olivier Lebarillec,Arnaud Favre, E Veran, Ingo Stassen, Astrid Gettel

Solid State Phenomena, (2014)

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Method And Device for The Depollution Of A Pelliculated Reticle

Arnaud Favre, Smail Hadj Rabah,Julien Bounouar

(2013)

Bibtex

Method and Device for Controlling the Manufacture of Semiconductor by Measuring Contamination

Arnaud Favre,Julien Bounouar

(2012)

Cited by1Bibtex

Saw-Pirani vacuum sensor with a new functioning mode and a fast response time

D Mercier, Germ N Bordel,P Brunetmanquat,Sophie Verrun,O Elmazria,F Sarry, Brahim Belgacem,Julien Bounouar

(2011)

Cited by4Bibtex

VOC induced particle generation during wafer transportation and its solution

Motoya Okazaki,Sharon Niehoff,Ninos Alkurjy,Cathy Cai, Chris Ngai, Petra Richtsteiger,Julien Bounouar

Advanced Semiconductor Manufacturing Conference, pp.196-199, (2010)

Cited by2EIWOSBibtex

Enhanced Sensitivity of SAW-Based Pirani Vacuum Pressure Sensor

K J Singh,O Elmazria,F Sarry,Pascal Nicolay,Kamal Ghoumid, Brahim Belgacem, Denis Mercier,Julien Bounouar

Sensors Journal, IEEE, no. 6 (2010): 1458-1464

Cited by20EIWOSBibtex

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Bounouar, JulienBinding

Papers9 papers

Bounouar, Julien