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Chemical Vapor Deposition of a Single-Crystalline MoS₂ Monolayer through Anisotropic 2D Crystal Growth on Stepped Sapphire Surface

Iryna Kandybka,Benjamin Groven, Henry Medina Silva,Stefanie Sergeant,Ankit Nalin Mehta,Serkan Koylan,Yuanyuan Shi,Sreetama Banerjee,Pierre Morin,Annelies Delabie

ACS NANOno. 4 (2024): 3173-3186

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Guiding Principles for the Design of a Chemical Vapor Deposition Process for Highly Crystalline Transition Metal Dichalcogenides

Vladislav Voronenkov,Benjamin Groven, Henry Medina Silva,Pierre Morin, Stefan De Gendt

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE (2024)

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Advanced EUV patterning of 2D TMDs for CMOS integration

Vina Faramarzi, Etienne de Poortere, Syam Parayil Venugopalan, Pieter Woltgens, Youngtag Woo,Mark van de Kerkhof, Pawan Kumar, Henry Medina Silva,Pierre Morin,Inge Asselberghs,Chelsey Dorow, Kevin O'Brien,

Novel Patterning Technologies 2024 (2024)

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Overview of scalable transfer approaches to enable epitaxial 2D material integration

Steven Brems,Souvik Ghosh,Quentin Smets,Marie-Emmanuelle Boulon, Andries Boelen,Koen Kennes,Hung-Chieh Tsai,Francois Chancerel,Clement Merckling,Pieter-Jan Wyndaele,Jean-Francois De Marneffe,Tom Schram,

2023 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI-TSA/VLSI-DATpp.1-2, (2023)

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Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach

S. Kundu, D. H. van Dorp, T. Schram,Q. Smets, S. Banerjee,B. Groven, D. Cott, S. Decoster, P. Bezard, F. Lazzarino,K. Banerjee, S. Ghosh,

2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)pp.1-2, (2023)

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Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach

S. Kundu, D. H. van Doip,Tom Schram,Quentin Smets, S. Banerjee,Benjamin Groven,Daire Cott, S. Decoster, P. Bezard, F. Lazzarino,K. Banerjee, S. Ghosh,

VLSI Technology and Circuitspp.1-2, (2023)

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Nucleation and coalescence of tungsten disulfide layers grown by metalorganic chemical vapor deposition

Haonan Tang, Sergej Pasko,Simonas Krotkus, Thorsten Anders, Cornelia Wockel,Jan Mischke,Xiaochen Wang,Ben Conran,Clifford McAleese, Ken Teo,Sreetama Banerjee, Henry Medina Silva,

Journal of Crystal Growth (2023): 127111

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300mm in-line metrologies for the characterization of ultra-thin layer of 2D materials

A. Moussa, J. Bogdanowicz, B. Groven,P. Morin, M. Beggiato, M. Saib, G. Santoro, Y. Abramovitz, K. Houchens, S. Ben Nissim, N. Meir, J. Hung,

METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVII (2023)

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Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films

Antony Premkumar Peter, Alfonso Sepulveda Marquez,Johan Meersschaut,Praveen Dara,Timothee Blanquart,Takayama Tomomi,Ebisudani Taishi, Shiba Elichiro,Yosuke Kimura, Sander van Gompel,Pierre Morin

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B（2022）

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(Invited) Addressing Key Process and Material Challenges to Enable 2D Transition Metal Dichalcogenide Channels in Advanced Logic Devices

Pierre Morin,Benjamin Groven,Henry Medina,Yuanyuan Shi,Vladislav Voronenkov, Iryna Kandybka,Annelies Delabie, Dries Vranckx, Brecht De Vos, Sebastiaan Nijs,Thibaut Maurice,Daire Cott,

ECS Meeting Abstractsno. 15 (2022): 822-822

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