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Research Interests

Papers共 46 篇Author StatisticsCo-AuthorSimilar Experts

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Improvement of Low-Frequency Noise Behavior with Chloridic Precursor Materials at ALD Process
Daniel Hessler,Ricardo Olivo, Tim Baldauf,Konrad Seidel,Raik Hoffmann, Chaiwon Woo,Maximilian Lederer,Yannick Raffel
Memories - Materials, Devices, Circuits and Systems (2024): 100095
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Lattice Scattering Related Flicker Noise in Silicon-Doped Hafnium Oxide FeFETs
Daniel Hessler,Ricardo Olivo,Konrad Seidel,Raik Hoffmann,Sourav De,Yannick Raffel
2024 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI TSA (2024)
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Dopant-Dependent Flicker Noise of Hafnium Oxide Ferroelectric Field Effect Transistor
Daniel Hessler,Ricardo Olivo,Konrad Seidel,Raik Hoffmann,Sourav De,Yannick Raffel
8TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE, EDTM 2024pp.295-297, (2024)
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Author Statistics

#Papers: 47

#Citation: 798

H-Index: 12

G-Index: 28

Sociability: 5

Diversity: 2

Activity: 15

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