Steven J. Holmes

Antibody Technologies New Fronteirs UK

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Scalable Nanostructured Carbon Electrode Arrays for Enhanced Dopamine Detection

Silvia Demuru, Luca Nela, Nathan Marchack,Steven J Holmes,Damon B Farmer,George S Tulevski, Qinghuang Lin,Hariklia Deligianni

ACS sensors, no. 4 (2018): 799-805

Cited by4WOSBibtex

Reducing Line Edge Roughness in Si and SiN through plasma etch chemistry optimization for photonic waveguide applications

Nathan P. Marchack,Marwan H. Khater,Jason S. Orcutt,Josephine B. Chang,Steven J. Holmes,Tymon Barwicz, Swetha Kamlapurkar,William M. J. Green,Sebastian U. Engelmann

ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VI, (2017)

Bibtex

Y-SHAPED CARBON NANOTUBES AS AFM PROBE FOR ANALYZING SUBSTRATES WITH ANGLED TOPOGRAPHY, METHOD FOR THEIR MANUFACTURE, METHOD FOR PERFORMING ATOMIC FORCE MICROSCOPY AND METHOD FOR SELECTIVELY MODIFYING THE SURFACE OF A SUBSTRATE USING SAID Y-SHAPED NANOTUBES

Carol A Boye, Toshiharu Furukawa,Mark C Hakey,Steven J Holmes, David V Horak,Charles W Koburger

(2015)

Bibtex

STRUCTURE AND METHOD FOR FORMING CMOS WITH NFET AND PFET HAVING DIFFERENT CHANNEL MATERIALS

Kangguo Cheng, Bruce B Doris,Steven J Holmes,Ali Khakifirooz

(2015)

Cited by11Bibtex

METHOD OF MULTIPLE PATTERNING TO FORM SEMICONDUCTOR DEVICES

Kuangjung Chen, Kangguo Cheng, Bruce B Doris,Steven J Holmes, Sen Liu

(2014)

Cited by3Bibtex

SIMULTANEOUS PHOTORESIST DEVELOPMENT AND NEUTRAL POLYMER LAYER FORMATION

Steven J Holmes, J Abdallah,Joy Cheng,Matthew E Colburn,Chichun Liu

(2014)

Cited by23Bibtex

GRAPHO-EPITAXY DSA PROCESS WITH DIMENSION CONTROL OF TEMPLATE PATTERN

J Abdallah,Matthew E Colburn,Steven J Holmes,Chichun Liu

(2014)

Cited by32Bibtex

Directed self-assembly process implementation in a 300mm pilot line environment

Chichun Liu, I Cristina Estradaraygoza, J Abdallah,Steven J Holmes,Yunpeng Yin, Anthony Schepis, Michael Cicoria, David Hetzer,Hsinyu Tsai,Michael A Guillorn,Melia Tjio,Joy Cheng

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V, (2013)

Cited by13Bibtex

HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THEREOF

Gregory Breyta, Kuangjung Chen,Steven J Holmes,Wusong Huang, Sen Liu

(2013)

Bibtex

Tone inversion with partial underlayer etch for semiconductor device formation

John C Arnold,Sean D Burns,Matthew E Colburn,Steven J Holmes,Yunpeng Yin

(2013)

Cited by1Bibtex

Development of KrF hybrid resist for a dual-isolation application

Sen Liu,Steven J Holmes, Kuang Jung Chen,Wusong Huang,Ranee Kwong,Greg Breyta,Bruce B Doris,Kangguo Cheng,Scott D Luning,Maud Vinet,Laurent Grenouillet,Qing Liu

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXX, (2013)

Bibtex

Carbon nanotube structures for enhancement of thermal dissipation from semiconductor modules

Veeraraghavan S Basker, Toshiharu Furukawa,Mark C Hakey,Steven J Holmes,Charles W Koburger, Krishna V Singh

(2012)

Cited by9Bibtex

Directed self-assembly defectivity assessment. Part II

Chris Bencher,He Yi, Jessica Zhou, Manping Cai, Jeffrey A Smith, Liyan Miao,Ofir Montal, Shiran Blitshtein, Alon Lavi,Kfir Dotan,Huixiong Dai,Joy Y Cheng

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES IV, (2012)

Cited by78Bibtex

Design, synthesis, and characterization of KrF negative developable bottom anti-reflective coating materials

S Liu, Kuangjung Chen,Wusong Huang,S A V Holmes, Karen Huang, Nicolette Fender,Ranee Kwong,Brian Osborn, Cherry Tang, Chunghsi Wu,Mark Slezak

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIX, (2012)

Bibtex

Device having and method for forming fins with multiple widths for an integrated circuit

Kangguo Cheng,Bruce B Doris,Steven J Holmes, Xuefeng Hua, Ying Zhang

(2012)

Cited by4Bibtex

Critical challenges for non-critical layers

Javier Gomez,Irene Popova,Binzhen Zhang, H Kry,Steven J Holmes, S T Nakagawa,Tokumichi Murakami, Chan Sam Chang,Cheol Kim

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII, (2011)

Bibtex

Field effect transistor

Toshiharu Furukawa,Mark C Hakey,Steven J Holmes, David V Horak,Charles W Koburger

(2011)

Bibtex

Semiconductor transistors with contact holes close to gates

Toshiharu Furukawa,Mark C Hakey,Steven J Holmes, David V Horak,Charles W Koburger, William R Tonti

(2011)

Cited by2Bibtex

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

C D Bencher, J G Smith, Liyan Miao,Cathy Cai,Yongmei Chen,Joy Y Cheng,Daniel P Sanders,Melia Tjio,Hoa D Truong,Steven J Holmes,William D Hinsberg

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES III, (2011)

Cited by140Bibtex

Chemical Trim of Photoresist Lines by Means of A Tuned Overcoat

Sean D Burns,Matthew E Colburn,Steven J Holmes,Wusong Huang

(2011)

Cited by23Bibtex

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Steven J. HolmesBinding

Papers200 papers

Steven J. Holmes