Chitose Institute of Science and Technology
Tatsuo Izawa is a pioneer in the field of optical devices and components for communication systems. He invented the electro-migration method for the fabrication of planar lightwave circuits and the Vapor-phase Axial Deposition (VAD) method of optical fiber fabrication. He also conducted pioneering work on silica-based planar lightwave circuits. Izawa has spent the majority of his career as a researcher and manager at the Nippon Telegraph and Telephone Corporation (NTT). This interview begins with a brief overview of Izawa’s education, which culminated in a Ph.D. in Electronics from the University of Tokyo in 1970. Izawa discusses his doctoral thesis on infrared holographic memory and his early research on semiconductor laser dynamics and optical fibers at NTT. He outlines his tenures at Musashino and the University of California at Berkeley, and his return to NTT. Izawa discusses his work in the development of the modified chemical vapor deposition (MCVD) and outside vapor phase-deposition (OVD) methods. He also details his invention of VAD and compares his projects with Corning’s ATT method. The interview concludes with a discussion of Izawa’s current work at NTT, including his current roles in research and management.