Vincent D.-H. Hou - Taiwan SemiconductorManufacturing Company

Microscopy and microanalysis the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canadano. Supplement_1 (2023): 288-290

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Scaled Contact Length with Low Contact Resistance in Monolayer 2D Channel Transistors

2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (2023)

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Comprehensive Study of Contact Length Scaling Down to 12 Nm with Monolayer MoS2 Channel Transistors

IEEE TRANSACTIONS ON ELECTRON DEVICESno. 12 (2023): 6680-6686

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Complementary Carbon Nanotube Metal–oxide–semiconductor Field-Effect Transistors with Localized Solid-State Extension Doping

Zichen Zhang,Matthias Passlack,Gregory Pitner,Shreyam Natani,Sheng-Kai Su,Tzu-Ang Chao,San Lin Liew,Vincent D.-H. Hou,Chen-Feng Hsu, Wade E. Shipley,Nathaniel Safron,Gerben Doornbos,Tsung-En Lee,Iuliana Radu,Andrew C. Kummel,Prabhakar Bandaru,H.-S. Philip Wong

Nature Electronicsno. 12 (2023): 999-1008

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