Chen Yongmei

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Papers26 papers

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Novel solutions to enable contact resistivity <1E-9 Ω-cm2 for 5nm node and beyond

Raymond Hung,Fareen Adeni Khaja, Kelly E Hollar,Kv Rao, Samuel Munnangi,Yongmei Chen,Motoya Okazaki,Yi-Chiau Huang, Xuebin Li, Hua Chung,Osbert Chan,Christopher Lazik

symposium on vlsi technology, (2018)

Bibtex

Novel solutions to enable contact resistivity 2 for 5nm node and beyond

Raymond Hung,Fareen Adeni Khaja, Kelly E Hollar,K.V. Rao, Samuel Swaroop Munnangi,Yongmei Chen,Motoya Okazaki, Yi-Chiau Huang, Xuebin Li, Hua Chung,Osbert Chan,Christopher Lazik

symposium on vlsi technology, (2018)

Bibtex

Tracking defectivity of EUV and SADP processing using bright-field inspection

Nadine Alexis,Chris Bencher,Yongmei Chen,Huixiong Dai,Kfir Dotan, Dale Huang, Alison Nalven, Chris Ngai, Gaetano Santoro, Bharath Vijayaraghavan,Peng Xie,Jun Xue

Proceedings of SPIE, (2014)

Bibtex

Post-litho line edge/width roughness smoothing by ion implantations

T Y Ma,Peng Xie, Ludovic Godet, Patrick Martin, C Campbell,Jun Xue, Liyan Miao,Yongmei Chen,Huixiong Dai,Chris Bencher, Christopher S Ngai

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXX, (2013)

Cited by4Bibtex

Impact of process decisions and alignment strategy on overlay for the 14nm node

David Laidler, Koen D Have,Philippe Leray,J Hermans, J Boemmels,Shaunee Cheng,Huixiong Dai,Yongmei Chen,Bencherki Mebarki, Chris Ngai

Proceedings of SPIE, (2013)

Bibtex

Towards manufacturing a 10nm node device with complementary EUV lithography

J Hermans,Huixiong Dai,Ardavan Niroomand, David Laidler, Ming Mao,Yongmei Chen,Philippe Leray, Chris Ngai,Shaunee Cheng

Proceedings of SPIE, (2013)

Cited by4Bibtex

Template Patterning: Flexible Control of Block Copolymer Directed Self‐Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning (Adv. Mater. 23/2012)

He Yi,Xinyu Bao,Jie Zhang,Chris Bencher,Liwen Chang,Xiangyu Chen,R Tiberio,James W Conway,Huixiong Dai,Yongmei Chen,Subhasish Mitra,H S Philip Wong

Advanced Materials, (2012)

Bibtex

Small particle defect characterization on critical layers of 22nm Spacer Self-Aligned Double Patterning (SADP)

Gurminder Singh,Kfir Dotan, Saar Shabtay, Manping Cai, Noam Shachar, Chris Ngai,Chris Bencher, Liyan Miao,Yongmei Chen

Proceedings of SPIE, (2012)

Bibtex

Flexible control of block copolymer directed self-assembly using small, topographical templates: potential lithography solution for integrated circuit contact hole patterning

He Yi,Xin-Yu Bao,Jie Zhang,Christopher Bencher,Li-Wen Chang,Xiangyu Chen,Richard Tiberio,James Conway,Huixiong Dai,Yongmei Chen,Subhasish Mitra,H-S Philip Wong

ADVANCED MATERIALS, no. 23 (2012): 3107-3114

Cited by112WOSBibtex

Mandrel-based patterning: density multiplication techniques for 15nm nodes

Chris Bencher,Huixiong Dai, Liyan Miao,Yongmei Chen, Ping Xu, Shiany Oemardani, Jason Sweis,Vincent Wiaux,J Hermans,Liwen Chang,Xinyu Bao,He Yi

Proceedings of SPIE, (2011)

Cited by25Bibtex

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

C D Bencher, J G Smith, Liyan Miao,Cathy Cai,Yongmei Chen,Joy Y Cheng,Daniel P Sanders,Melia Tjio,Hoa D Truong,Steven J Holmes,William D Hinsberg

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES III, (2011)

Cited by140Bibtex

Spatial frequency multiplication techniques towards half-pitch 10nm patterning

Yongmei Chen, Liyan Miao, Ping Xu, Xumou Xu, Hao Chen, Pokhui Blanco,Raymond Hung, Christopher S Ngai

Proceedings of SPIE, (2011)

Cited by7Bibtex

Innovative self-aligned triple patterning for 1x half pitch using single spacer deposition-spacer etch step

Bencherki Mebarki, H D Chen,Yongmei Chen, Aunchan Wang, Jingmei Liang,Kedar Sapre,Tushar Mandrekar, Xiaolin Chen, Ping Xu, Pokhui Blanko, Chris Ngai,Chris Bencher

Proceedings of SPIE, (2011)

Cited by12Bibtex

SRAM, NAND, DRAM contact hole patterning using block copolymer directed self-assembly guided by small topographical templates

Xinyu Bao,He Yi,Chris Bencher,Liwen Chang,Huixiong Dai,Yongmei Chen, P T Joseph Chen,H S Philip Wong

(2011)

Cited by50Bibtex

Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography

Bencherki Mebarki, Liyan Miao,Yongmei Chen, James Yu, Pokhui Blanco, James Makeeff, Jen Shu,Chris Bencher,Mehul Naik, Christopher Sui Wing Ngai

Proceedings of SPIE, (2010)

Cited by2Bibtex

Decomposition strategies for self-aligned double patterning

Yuansheng Ma, Jason Sweis,Chris Bencher,Huixiong Dai,Yongmei Chen,J Cain, Yunfei Deng,Jongwook Kye,Harry J Levinson

(2010)

Cited by46Bibtex

Demonstration of 32nm half-pitch electrical testable NAND FLASH patterns using self-aligned double patterning

Shiyu Sun,Chris Bencher,Yongmei Chen,Huixiong Dai, Manping Cai, Jaklyn Jin, Pokhui Blanco, Liyan Miao, Ping Xu, Xumou Xu, James Yu,Raymond Hung

(2009)

Cited by19Bibtex

Implementing self-aligned double patterning on non-gridded design layouts

Huixiong Dai, Jason Sweis,Chris Bencher,Yongmei Chen, Jen Shu, Xumou Xu, Chris Ngai,Judy Huckabay,Milind Weling

(2009)

Cited by20Bibtex

Gridded design rule scaling: taking the CPU toward the 16nm node

Chris Bencher,Huixiong Dai,Yongmei Chen

(2009)

Cited by68Bibtex

Alignment and overlay improvements for 3x nm and beyond process with CVD sidewall spacer double patterning

Huixiong Dai,Chris Bencher,Yongmei Chen, Shiyu Sun, Xumou Xu, Chris Ngai

(2009)

Cited by8Bibtex

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Chen YongmeiBinding

Papers26 papers

Chen Yongmei