检索
AI 对话
analysis
趋势分析
编组
开放平台
more
更多
排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
VIPCreated with Sketch.
研究兴趣

论文共 17 篇作者统计合作学者相似作者

按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Improving After-Etch Overlay Performance Using High-Density In-Device Metrology In Dram Manufacturing
Ik-Hyun Jeong, Seungwoo Koo,Hyun-Sok Kim, Jung-Il Hwang,Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju,Kang-San Lee,Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann,
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV (2020)
引用0浏览0引用
0
0
Scanner and etch co-optimized corrections for better overlay and CD control
Ik-Hyun Jeong, Seung-Woo Koo,Hyun-Sok Kim,Jae-Wuk Ju,Young-Sik Kim, Yong-Tae Cho, Heung-Joo Kim,Katja Viatkina, Tom van Hemert, Ruud de Wit, David Deckers,Owen Chen,
ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING VIII (2019)
引用0浏览0引用
0
0
Improved Wafer Alignment Model Algorithm for better On-Product Overlay
Ik-Hyun Jeong,Hyun-Sok Kim, Yeong-Oh Kong, Ji-Hyun Song,Jae-Wuk Ju,Young-Sik Kim,Cees Lambregts, Miao Yu, Rizvi Rahman, Leendertjan Karssemeijer, Elliott McNamara, Paul Bocker,
Proceedings of SPIE (2019)
引用2浏览0引用
2
0
Accuracy optimization with wavelength tunability in overlay imaging technology
Honggoo Lee, Yoonshik Kang, Sangjoon Han, Kyuchan Shim,Minhyung Hong,Seungyoung Kim,Jieun Lee,Dongyoung Lee, Eungryonh Oh, Ahlin Choi,Youngsik Kim,Tal Marciano,
Proceedings of SPIE (2018)
引用3浏览0引用
3
0
Spacer multi-patterning control strategy with optical CD metrology on device structures
Jongsu Lee,Byounghoon Lee, Won-Kwang Ma,Sangjun Han,Young-Sik Kim,Noh-Jung Kwak, Thomas Theeuwes,Wei Guo,Yi Song, Baukje Wisse, Stefan Geerte Kruijswijk, Hugo Augustinus Joseph Cramer,
Proceedings of SPIE（2016）
引用2浏览0引用
2
0
加载更多
作者统计
  • 合作者
  • 学生
  • 导师
暂无相似学者，你可以通过学者研究领域进行搜索筛选
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cn