Effects of MEVVA-implanted chromium on the structure and properties of CrN film
Thin Solid Films(2004)
摘要
The effect of a metal vapor vacuum arc (MEVVA)-implanted Cr interlayer on the microstructure of the CrN coating on the silicon wafer was investigated. Two types of the CrN-coated specimens were prepared with and without an MEVVA-implanted Cr interlayer—CrN/Cr/Si and CrN/Si—by cathodic arc plasma deposition. Both specimens of the same batch were annealed at 500 °C for 2 h in an N2/H2 atmosphere, to elucidate the thermal stability of the CrN film. The columnar structure of CrN/Cr/Si was observed by cross-sectional transmission electron microscopy. The X-ray diffraction results revealed the presence of CrN, and that (220) is the preferred orientation of both CrN/Si and CrN/Cr/Si. However, CrN/Si revealed a phase transformation from CrN to Cr2N during annealing, which is due largely to stress relaxation in the film. A MEVVA-implanted Cr interlayer can effectively relax the residual stress in the growing CrN of the coating and prevent a phase transformation in the CrN/Cr/Si assembly during annealing.
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关键词
Metal vapor vacuum arc,Cathodic arc plasma deposition,Annealing,Phase transformation
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