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Challenges in high NA, polarization, and photoresists
PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE), (2002): 11-24
Abstract
Optical lithography is being pushed into a regime of extreme-numerical aperture (extreme-NA). The implications of the nonscalar effects of high-NA lithography (above 0.50) have been discussed now for many years'. This paper considers the consequences of imaging at numerical apertures above 0.70 with the oblique imaging angles required for...More
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