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Surface roughness effects in quantitative XPS: magic angle for determining overlayer thickness

APPLIED SURFACE SCIENCE, no. 4 (1997): 342-346

Cited by: 94|Views2
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Abstract

The use of X-ray photoelectron spectroscopy (XPS) as a technique for non-destructive depth profiling of technical samples is often hindered by their roughness. In this paper, we elaborate on earlier work where we reported on the apparent existence of a 'magic' angle for the determination of the thickness of uniform overlayers on rough sub...More

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