High-Speed Schottky-Barrier pMOSFET With$f_T = 280 hbox GHz$

IEEE Electron Device Letters(2004)

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摘要
High-speed results on sub-30-nm gate length pMOSFETs with platinum silicide Schottky-barrier source and drain are reported. With inherently low series resistance and high drive current, these deeply scaled transistors are promising for high-speed analog applications. The fabrication process simplicity is compelling with no implants required. A sub-30-nm gate length pMOSFET exhibited a cutoff frequ...
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关键词
MOSFET circuits,Implants,Silicides,Fabrication,Leakage current,Platinum,MOS devices,Radio frequency,Lithography,Etching
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