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Pulsed Laser Annealing of Zinc Implanted Gaas

Electronics letters(1978)

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摘要
Samples of n type GaAs implanted with 1015Zn+/cm2 at room temperature were irradiated with a ruby laser of pulse length 0.8 ms. For samples coated with Si3N4 a laser energy of 1.5-2.5 J/cm2 produced electrical activity of 40-50% of the implanted dose. Peak hole concentrations up to about 7 × 1019 cm-3 were measured. Uncoated samples irradiated with similar laser energies were not electrically acti...
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关键词
annealing,carrier density,carrier mobility,gallium arsenide,III-V semiconductors,ion implantation,laser beam applications,semiconductor technology,zinc
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