High-Current-Gain SiC BJTs With Regrown Extrinsic Base and Etched JTE

IEEE Transactions on Electron Devices(2008)

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摘要
This paper describes successful fabrication of 4H-SiC bipolar junction transistors (BJTs) with a regrown extrinsic base layer and an etched junction termination extension (JTE). Large-area 4H-SiC BJTs measuring 1.8 times 1.8 mm (with an active area of 3.24 ) showed a common emitter current gain of 42, specific on-resistance of 9 , and open-base breakdown voltage of 1.75 kV at room temperature. The...
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关键词
Junctions,Silicon carbide,Epitaxial growth,Temperature measurement,Ion implantation,Conductivity,Oxidation
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