Process optimization of CF4/Ar plasma etching of Au using I-optimal design

THIN SOLID FILMS, pp. 3919-3922, 2009.

Cited by: 2|Views2
EI

Abstract:

In this paper, reactive ion etching of Au is performed with CF4/Ar gases, and process optimization method is suggested using a statistically established process model. The I-optimal design was employed to set up the etching experiment with operating parameters, namely, gas composition, RF power and chamber pressure. Its analysis was perfo...More

Code:

Data:

Get fulltext within 24h
Bibtex
Your rating :
0

 

Tags
Comments