Process optimization of CF4/Ar plasma etching of Au using I-optimal design
THIN SOLID FILMS, pp. 3919-3922, 2009.
In this paper, reactive ion etching of Au is performed with CF4/Ar gases, and process optimization method is suggested using a statistically established process model. The I-optimal design was employed to set up the etching experiment with operating parameters, namely, gas composition, RF power and chamber pressure. Its analysis was perfo...More
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