Long-Range Tails Of Damage And Implantation Profiles In Gold And Copper

Copper crystals were implanted with 300 keV Ni at 77. 300 and 700 K to about 2 × 10 16 ions/cm −2 . The resulting nickel concentration profiles were measured with sputter sectioning and simultaneous secondary ion mass spectrometry (SIMS). Damage profiles in thin gold crystals were measured with the transmission sputtering technique. In all cases the profiles exhibit approximate exponential tails which emerge from the damage and implantation profile maximum respectively and reach far beyond the ranges expected from random cascade theory, indicating channeling processes. In order to understand these results Monte Carlo computer simulations have been carried out using the MARLOWE code. which takes into account the target being a single crystal. The relevance of the present investigations to radiation enhanced diffusion and implantation processes is pointed out.