Characterization of aluminium nitride thin film structure using second-harmonic generation

Optical Materials(1994)

引用 7|浏览3
暂无评分
摘要
Second-harmonic generation measurements are carried out on aluminium nitride thin films deposited by dc magnetron sputtering. Second-order nonlinear susceptibility components are found to be around 6 pmV-1 for d33 and 0.15 pmV-1 for d31. The crystallographic structure of the films is related to the variations of the second-harmonic power as a function of the optical axis orientation. Theoretical calculations are confirmed by experimental results obtained on several samples grown under various deposition conditions.
更多
查看译文
关键词
second harmonic generation,thin film
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要