Clean reconstructed InAs(111) A and B surfaces using chemical treatments and annealing

Well-ordered clean InAs(111) A and B surfaces have been prepared using HCl–isopropanol solutions and characterized using low-energy electron diffraction and photoemission spectroscopy. The as-treated surfaces are covered by a layer containing arsenic and small amounts of InClx. Annealing induces desorption of the overlayer and reveals (2×2) and (1×1) structures on the A and B surfaces, respectively. For both surfaces, the surface components of the In 4d and As 3d reveal a charge transfer from the electropositive surface indium to the electronegative surface arsenic. The major advantage of this preparation method over conventional thermal cleaning is a significant reduction in the annealing temperature (≈250°C) thereby avoiding anion evaporation.