Atomic scale KMC simulation of {100} oriented CVD diamond film growth under low substrate temperature - Part II. Simulation of CVD diamond film growth in C-H system and in Cl-containing systems

Journal of University of Science and Technology Beijing: Mineral Metallurgy Materials (Eng Ed), Volume 9, Issue 6, 2002, Pages 453-457.

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Abstract:

The growth of {100}-oriented CVD diamond film under two modifications of J-B-H model at low substrate temperatures was simulated by using a revised KMC method at atomic scale. The results were compared both in Cl-containing systems and in C-H system as follows: (1) Substrate temperature can produce an important effect both on film deposit...More

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