Atomic scale KMC simulation of {100} oriented CVD diamond film growth under low substrate temperature - Part I: Simulation of CVD diamond film growth under Joe-Badgwell-Hauge model

Journal of University of Science and Technology Beijing: Mineral Metallurgy Materials (Eng Ed), Volume 9, Issue 5, 2002, Pages 367-371.

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Abstract:

The growth of {100} oriented CVD (chemical vapor deposition) diamond film under Joe-Badgwell-Hauge (J-B-H) model is simulated at atomic scale by using the revised KMC (kinetic Monte Carlo) method. The results show that: (1) under Joe's model, the growth mechanism from single carbon species is suitable for the growth of {100} oriented CVD ...More

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