Atomic-scale kinetic Monte Carlo simulation of {100}-oriented diamond film growth in C-H and C-H-Cl systems by chemical vapour deposition

Chinese Physics Letters, Volume 19, Issue 7, 2002, Pages 1019-1020.

Cited by: 7|Bibtex|Views2|DOI:https://doi.org/10.1088/0256-307X/19/7/343
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Abstract:

We simulate the {lO0}-oriented diamond film growth of chemical vapour deposition (CVD) under different models in C-H and C-H-Cl systems in an atomic scale by using the revised kinetic Monte Carlo method. The simulation results show that: (1) the CVD diamond film growth in the C-H system is suitable for high substrate temperature, and the ...More

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