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氮离子注入法合成CNx膜的化学键表征

Peijiang Cao,Deliang Zhu,Xiaocui Ma,Yuewu Pan

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology（2005）

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Abstract
采用N离子注入金刚石膜和热解石墨方法合成了CNx膜,用Raman光谱和XPS谱对合成薄膜中C、N的化学键合状态进行了研究.通过与Raman光谱的比较,我们对合成样品XPS谱中N1s的化学键合状态作出如下归属:≈400.0 eV属于sp2 C-N键;≈398.5 eV则属于sp3 C-N键.结果显示:碳原子、氮原子间的化学键合状态,明显地依赖于衬底材料及注入N离子的能量.
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Key words
Chemical bond,Diamond,Nitrogen ion implantation
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