Development of adhesion promoters to enhance polymer/substrate interface toughness

Jay Im,T M Stokich,J Hetzner,G Buske,J Curphy,E O Shaffer,Gregory F Meyers

Braselton, GA（1999）

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摘要

The adhesion performance of photo-BCB coatings were investigated using a new adhesion promoter, AP-3000, based on vinyltriacetoxysilane (VTAS) chemistry. A modified edge lift-off test (m-ELT) was employed to evaluate adhesion performance of photo-BCB on various surfaces: Si, SiN, Cu, and Al. Use of AP-3000 resulted in a large improvement of adhesion energies for these interfaces. Atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) of these interfaces showed cohesive interfacial failure into the photo-BCB phase. The interfacial fracture energies approached the fracture toughness of photo-BCB, ca. 45 J/m2

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关键词

x-ray photoelectron spectra,adhesion,atomic force microscopy,dielectric thin films,failure analysis,fracture toughness,interface structure,optical polymers,packaging,polymer films,afm,ap-3000 adhesion promoter,al,al surface,cu,cu surface,si,si surface,sin,sin surface,vtas chemistry,x-ray photoelectron spectroscopy,xps,adhesion energy,adhesion performance,adhesion promoters,cohesive interfacial failure,interfacial fracture energy,modified edge lift-off test,photo-bcb,photo-bcb coatings,photo-bcb phase,polymer/substrate interface toughness,vinyltriacetoxysilane chemistry,fracture energy,polymers,spectroscopy,adhesives,testing,x ray photoelectron spectroscopy,chemistry

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