High threshold voltage in GaN MOS-HEMTs modulated by fluorine plasma and gate oxide

AlGaN/GaN high-electron-mobility transistors (HEMTs) have great potential for the next generation of power electronics. In this application, enhancement-mode (E-mode) metal-oxide-semiconductor (MOS) HEMTs with a threshold voltage (Vth) ~ 3 V are highly desirable as they allow simpler circuits and fail-safe operation. However, it has been ...More