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Two-dimensional device simulation for radio frequency performance of AlGaN/GaN HEMT

Semiconductor Technology International Conference(2015)

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摘要
In order to obtain better high frequency performance for GaN-based devices, we investigate the influence of the gate length Lg, the gate-source space Lgs, the gate-drain space Lgd, and the thickness of barrier AlGaN on frequency performance of AlGaN/GaN high electron mobility transistors (HEMTs) using silvaco TCAD simulation. Besides, the importance of Ohmic contact resistance Rc to current-gain cutoff frequency fT is also presented by our simulation. It presents that the fT increases dramatically with the decrease of Lg and Rc while Lgd and Lgs affect fT lightly. Meanwhile, the optimized thickness of AlGaN barrier layer is obtained in our structure.
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关键词
III-V semiconductors,aluminium compounds,contact resistance,gallium compounds,high electron mobility transistors,ohmic contacts,semiconductor device models,technology CAD (electronics),wide band gap semiconductors,AlGaN,GaN,HEMT,barrier layer,current-gain cutoff frequency,gate length,gate-drain space,gate-source space,high electron mobility transistor,ohmic contact resistance,radio frequency performance,silvaco TCAD simulation,two-dimensional device simulation
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