High-Uniformity Inductively Coupled Plasma Source With Magnetic Multicusp Confinement
IEEE TRANSACTIONS ON PLASMA SCIENCE(2011)
摘要
A high-uniformity inductively coupled plasma source is presented. The plasma uniformity is improved with a magnetic multicusp structure that surrounds the plasma chamber. A picture showing the alternating bright and dark plasma regions along the perimeter of the plasma chamber-an effect of the magnetic confinement-is presented as well.
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关键词
Inductively coupled plasma (ICP), magnetic multicusp confinement, plasma uniformity
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