Preparation Of Yba2cu3o7-Delta Thin-Films By Magnetron Sputtering With Insitu Plasma Oxidation

JOURNAL OF APPLIED PHYSICS(1990)

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摘要
Superconducting YBa2Cu3O7−δ thin films with surface roughness Ra∼20 A have been successfully prepared by either rf or dc magnetron sputtering. The substrate temperature was kept at 600–670 °C during deposition and a subsequent in situ plasma oxidation treatment was performed at 480–520 °C. The films deposited on single‐crystal SrTiO3 (100) exhibited zero resistance at 91 K and had the critical current density of 3×106 A/cm2. In this paper we describe the influences of fabrication conditions on film superconductivity.
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关键词
single crystal,high temperature superconductor,x ray diffraction,thin film,magnetron sputtering,surface roughness
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