In Situ Laser Crystallization Of Amorphous Silicon: Controlled Nanosecond Studies In The Dynamic Transmission Electron Microscope

APPLIED PHYSICS LETTERS(2010)

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摘要
We describe an in situ method for studying the influence of deposited laser energy on microstructural evolution during nanosecond laser driven crystallization of amorphous Si. By monitoring microstructural evolution as a function of deposited energy in a dynamic transmission electron microscope (DTEM), information on grain size and defect concentration can be correlated directly with processing conditions. This work demonstrates that DTEM studies are a promising approach for obtaining fundamental information on nucleation and growth processes that have technological importance for the development of thin film transistors. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3422473]
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关键词
amorphous semiconductors, crystallisation, elemental semiconductors, grain size, nucleation, silicon, transmission electron microscopes
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