Development of EUV resists based on various new materials

Hiroaki Oizumi,Kazuyuki Matsumaro,Julius Santillan,Gousuke Shiraishi,Koji Kaneyama,Kentaro Matsunaga,Toshiro Itani

ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVII, PTS 1 AND 2（2010）

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摘要

This paper summarizes the development of EUV resists based on various new materials: the lithographic evaluation results of EUV resists from resist material manufacturers using the small field exposure tool (SFET). We discuss the screening results of new resin materials based on calix[4]resorcinarene, "Noria" and fullerene.

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关键词

EUV resists,sensitivity,resolution,line-width-roughness (LWR),calix[4]resorcinarene,fullerene,Noria

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