METHOD OF MANUFACTURING SCALED EQUIVALENT OXIDE THICKNESS GATE STACKS IN SEMICONDUCTOR DEVICES AND RELATED DESIGN STRUCTUREMichael P Chudzik,Min Dai,Jinping Liu,Paul A Ronsheim,Joseph F Shepard,Shahab Siddiquimag(2013)引用 24|浏览9暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要