Fabrication Of Mesa-Type Ingaas Pin Pds With Inp Passivation Structure On 4-Inch Diameter Inp Substrate

Ryuji Yamabi, Yutaka Tsuji,Kouichirou Hiratsuka, Hiroaki Yano

2004 International Conference on Indium Phosphide and Related Materials, Conference Proceedings(2004)

引用 7|浏览9
暂无评分
摘要
We have successfully fabricated mesa-type InGaAs pin PDs with an InP passivation structure on a 4-inch diameter InP substrate. The dark current and capacitance of PDs with 80- mu m mesa diameter are 0.278 nA and 335 fF at a reverse bias voltage of 5 V, respectively. A responsivity is 0.91 A/W at an incident light wavelength of 13 10 nm. A 3-dB bandwidth for PDs with 80-mu m mesa diameter is 7.98 GHz at a reverse bias voltage of 5 V and an incident light wavelength of 1550 nm. The results show that the pin PDs on a 4-inch diameter InP substrate have sufficient characteristics for practical applications.
更多
查看译文
关键词
gallium arsenide,passivation,capacitance,dark current
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要