Relationships between EUV resist outgassing and contamination deposition at Selete

Hiroaki Oizumi,Kazuyuki Matsumaro, Satoshi Nomura,Julius Joseph Santillan,Toshiro Itani,Takeo Watanabe,Naohiro Matsuda,Tetsuo Harada,Hiroo Kinoshita

Proceedings of SPIE（2011）

引用 3|浏览4

暂无评分

摘要

This presentation summarizes the relationships between resist outgassing and contamination deposition for EUV resists, in the case of EUV irradiation with high illumination intensity (> 100mW/cm(2)). These relationships were obtained by determining the resist outgassing species by gas chromatography-mass spectroscopy (GC-MS) and the contamination on optical elements by witness sample testing.

查看译文

关键词

EUV resists,resist outgassing,GC-MS,witness sample,contamination

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要