29.2: Atomic Layer Deposition of Al2O3/ZrO2 Nanolaminate on the Plastic Substrates for the Flexible Display

Al2O3/ZrO2 nanolaminate was formed on plastic substrates by low frequency plasma-enhanced atomic layer deposition (PEALD) process for enhancement of barrier properties. A remarkable barrier performance was observed in the optimized nanolaminate structure, which was attributed to cover the drawback of each layer between the Al2O3/ZrO2 nanolaminate.