Effect of substrate temperature on residual stress of ZnO thin films prepared by ion beam deposition

jessica lynn hoffman
jessica lynn hoffman
nam soo kim
nam soo kim

Electronic Materials Letters, Volume 8, Issue 1, 2012, Pages 27-32.

Cited by: 25|Bibtex|Views0|
Other Links: academic.microsoft.com|link.springer.com
Keywords:
ZnO thin film ion beam deposition stress substrate temperature

Abstract:

We have investigated the effect of substrate temperature on micro-structural properties of ZnO thin films prepared by ion beam deposition technique. ZnO thin films were deposited on AlN-buffered Si (111) and sapphire (001) substrates at various substrate temperatures. The structural properties and surface morphologies were examined by hig...More

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