Electrochemical Deposition of Conformal and Functional Layers on High Aspect Ratio Silicon Micro/Nanowires

Nano letters, 2017.

Cited by: 13|Bibtex|Views6|DOI:https://doi.org/10.1021/acs.nanolett.7b01950
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Other Links: pubmed.ncbi.nlm.nih.gov|academic.microsoft.com

Abstract:

Development of new synthetic methods for the modification of nanostructures has accelerated materials design advances to furnish complex architectures. Structures based on one-dimensional (1D) silicon (Si) structures using top-down and bottom-up methods are especially prominent for diverse applications in chemistry, physics, and medicine....More

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