A fast machine learning-based mask printability predictor for OPC acceleration.

Continuous shrinking of VLSI technology nodes brings us powerful chips with lower power consumption, but it also introduces many issues in manufacturability. Lithography simulation process for new feature size suffers from large computational overhead. As a result, conventional mask optimization process has been drastically resource consuming in terms of both time and cost. In this paper, we propose a high performance machine learning-based mask printability evaluation framework for lithography-related applications, and apply it in a conventional mask optimization tool to verify its effectiveness.