Vertical Scaling of Metal/High-k Gate Stacked MOSFETs for Hp45 and BeyondTakeo Matsuki,T. Watanabe,T. Morooka,Motoyuki Sato,Masaru Kadoshima,T. Onizawa,Takahisa Eimori, M. Nakamura,Yasuo Nara,Yuzuru OhjiThe Japan Society of Applied Physics(2008)引用 0|浏览12暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要