Vertical Slit FET at 7-nm Node and Beyond

IEEE Transactions on Electron Devices(2016)

引用 28|浏览41
暂无评分
摘要
This paper investigates the n-type vertical slit FET (VeSFET) performance at 7-nm node and beyond by TCAD simulation. VeSFET is a twin-gate device with 3-D monolithic integration-friendly vertical terminals and horizontal channel manufactured based on SOI wafer with conventional CMOS fabrication hardware. The second gate provides the capability of transistor behavior adjustment and the potential f...
更多
查看译文
关键词
Logic gates,FinFETs,Metals,Layout,Atomic measurements
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要