Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs
Yuichiro Sasaki,Ludovic Godet,T. Chiarella,David P. Brunco, Tyler Rockwell,Jae Woo Lee,Benjamin Colombeau,Mitsuhiro Togo,Soon Aik Chew,Gerd Zschaetzsch,Kyung Bong Noh,An De Keersgieter,Guillaume Boccardi,Minsoo Kim,Geert Hellings,Patrick M. Martin,Wilfried Vandervorst,Aaron Thean,Naoto Horiguchi international electron devices meeting（2013）
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