Photocatalytic performance of TiVOx/TiO2 thin films prepared by bipolar pulsed magnetron sputter deposition

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B(2017)

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Abstract
TiO2 films were formed by sputtering, and TiVOx films were deposited by bipolar pulsed magnetron sputtering with pure Ti and V metal targets. The sputtering of V on Ti oxide had little effect on the orientation of the TiO2 (01) plane of the specimen assemblies. The main varying parameter was the vanadium pulse power. Sputtered V is supposed to undergo resputtering, favoring a low deposition rate and small thickness. TiO2 films that were sputtered with a vanadium pulse power of 150W were most effective in the photocatalytic decomposition of methylene blue solution. (C) 2017 American Vacuum Society.
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photocatalytic performance,tivox/tio2,magnetron sputter deposition,tivox/tio2,thin films
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