Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition

Seran Park
Seran Park
Hyunsu Shin
Hyunsu Shin
Seungho Song
Seungho Song
Dae Hong Ko
Dae Hong Ko

AIP ADVANCES, pp. 1253102017.

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Abstract:

Atmospheric pressure (AP) operation of plasma-enhanced chemical vapor deposition (PECVD) is one of promising concepts for high quality and low cost processing. Atmospheric plasma discharge requires narrow gap configuration, which causes an inherent feature of AP PECVD. Two dimensional radial gas flows in AP PECVD induces radial variation ...More

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