Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition
AIP ADVANCES, pp. 1253102017.
Atmospheric pressure (AP) operation of plasma-enhanced chemical vapor deposition (PECVD) is one of promising concepts for high quality and low cost processing. Atmospheric plasma discharge requires narrow gap configuration, which causes an inherent feature of AP PECVD. Two dimensional radial gas flows in AP PECVD induces radial variation ...More
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