N-Doped Tio2 Photocatalyst Coatings Synthesized By A Cold Atmospheric Plasma

This work presents a simple, fast (20 min treatment), inexpensive, and highly efficient method for synthesizing nitrogen-doped titanium dioxide (N-TiO2) as an enhanced visible light photocatalyst. In this study, N-TiO2 coatings were fabricated by atmospheric pressure dielectric barrier discharge (DBD) at room temperature. The composition and the chemical bonds of the TiO2 and N-TiO2 coatings were characterized by X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). The results indicate that the nitrogen element has doped the TiO2 lattice, which was further confirmed by Raman spectroscopy and grazing incidence X-ray diffraction (GIXRD). The doping mechanism was investigated using OES to study the plasma properties under different conditions. It suggests that the NH radicals play a key role in doping TiO2. The concentration of nitrogen in the N-TiO2 coatings can be controlled by changing the concentration of NH3 in the plasma or the applied power to adjust the concentration of NH radicals in the plasma. The band gap of N-TiO2 was reduced after NH3/Ar plasma treatment from 3.25 to 3.18 eV. Consequently, the N-TiO2 coating showed enhanced photocatalytic activity under white-light-emitting-diode (LED) irradiation. The photocatalytic degradation rate for the N-TiO2 coating was about 1.4 times higher than that of the undoped TiO2 coating.